The UV-KUB 3 is a next-generation compact mask aligner featuring a collimated UV-LED light source, delivering sub-micron resolution (<1 µm) and uniform exposure without requiring a cleanroom. Designed for substrates up to 6” and photomasks up to 7”, it’s perfect for microfluidics, MEMS, and semiconductor applications.
General
Compact UV mask aligner for microfluidics photolithography
UV-KUB 3 is a compact UV mask aligner designed for microfluidics photolithography, soft lithography master fabrication, MEMS prototyping, and semiconductor R&D. It combines sub-micron alignment capability, collimated UV-LED illumination, and a fully enclosed format for repeatable lithography workflows without the complexity of a traditional cleanroom installation.
Why it works well for microfluidics
UV-KUB 3 is especially well suited to microfluidic device fabrication, where alignment quality, exposure uniformity, and process repeatability directly affect channel geometry and multilayer registration.
- Reliable UV exposure for SU-8 and other standard UV photoresists
- Multilayer alignment capability for complex chip architectures
- Low substrate heating, useful for sensitive materials and coatings
- Compact footprint for R&D labs and prototyping environments
Typical applications
- Soft lithography masters for microfluidics
- Lab-on-chip prototyping and multilayer structures
- MEMS and microsystems patterning
- Semiconductor and microelectronics R&D
- High-resolution UV lithography on heat-sensitive substrates
Practical: the fully enclosed system can be used without a cleanroom for many workflows.
Fast setup and operator workflow
Designed for repeatable lithography runs
UV-KUB 3 simplifies daily photolithography work with a user-friendly interface and practical hardware features that improve throughput and reduce handling risk.
- Automatic pre-alignment for quicker setup between runs
- Removable photomask holder to protect fragile masks during substrate changes
- Continuous and flashing exposure modes for process flexibility
- Programmable cycles to standardize repeated exposure workflows
Collimated UV-LED illumination, built for precision and usability
The 365 nm collimated UV-LED source provides homogeneous exposure, low thermal impact, and long service life compared with conventional lamp-based solutions. This helps maintain feature fidelity while making day-to-day operation simpler and lower maintenance.
Exposure quality illustrated
For photoresist and mask compatibility details, see the Specifications and Documentation tabs.
Content
1x UV-KUB 3 Mask Aligner
1x Power Supply
1x User Manual
Specifications
| |
KL-UV-KUB-3-4 |
KL-UV-KUB-3-6 |
| Minimum Feature Size |
1 µm |
| Multilayer Alignment Accuracy |
1 µm |
| Divergence Angle |
< 2° |
| Max Substrate Size |
Ø 4" (100×100 mm²) |
Ø 6" (150×150 mm²) |
| Max Mask Size* |
Ø 5" |
Ø 7" |
| Exposure Wavelength |
365 nm ± 5 nm |
| Power Density |
≥ 40 mW/cm² ± 5% |
| Exposure Homogeneity |
± 5% |
| LED Lifetime |
> 10,000 hours |
| Exposure Modes |
Continuous or Flashing |
| Visualization Cameras |
2× HD CMOS cameras |
| Interface |
15.6" Color Touchscreen + Joypad |
| Photomask Handling |
Removable photomask holder |
| Contact Modes |
Hard (physical) or Soft (proximity) |
| Visualization Resolution |
1.5 µm |
| Substrate Alignment Resolution |
0.4 µm (XYZ), θ = 5×10⁻⁴° |
| Measuring Distance Resolution |
0.5 µm |
| Programmable Cycles |
Up to 100 |
| Exposure Cycle Duration |
1 s to 1h 59 min |
| Substrate Heating |
< 1°C during exposure |
| Photoresist Compatibility |
All UV photoresists (AZ®, SU-8, Shipley, SQ, etc.) |
| Mask Compatibility |
Chrome and flexible film photomasks |
| Environment Requirement |
No cleanroom needed (fully enclosed) |
| Dimensions (L×W×H) |
475 × 480 × 515 mm |
| Weight |
55 kg (121 lbs) |
| Power Supply |
100–110V / 220–240V – 50 Hz |
| Power Consumption |
200 W |
| Operating Temperature |
15°C to 30°C (± 1°C stability) |
*Optional mask adapters available on request
Documentation
UV-KUB 3 Datasheet
