We offer a unique product, allowing you to make your own microfabrication, soft lithography, SU8-MOLD, and PDMS chips, directly in your laboratory, without using a clean room.
General
Produce SU-8 molds & PDMS chips without a clean room
Nous vous fournissons tous les équipements nécessaire, ainsi que l'installation et la formation. Vous pourrez produire vos puces microfluidiques sans dépendre de personne.
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Save Time : no subcontractor needed, you can produce your chips in a day.
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Easy to Use : ready-to-install, with clear instructions
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Save Space : no need of a clean-room: the same results can be obtained on 3m2.
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High resolution : Reach the same resolution than the one you can get inside clean room.
Full Soft lithography & PDMS chip station
A complete offer for soft lithography, to produce your own SU-8 molds and PDMS chips without the need of a clean room.
The lithography station bundles all the instruments necessary for soft lithography, from the uv exposure sytem and plasma cleaner to the hot plate, chimical, we selected every instruments needed for PDMS chips and mold fabrication. Produce your chips directly in your lab bringing convenience and cutting on exploitation costs, in less than 24 hours.
The fabrication process is highly reproductible, allowing you to produce series of similar chips.
Comes with all necessary lab accessories (silicon wafers, tweezers, glass lides, petri dishes, disposable cups, stirring rods, scalpels, etc...) and chemicals (SU8, SU8 developper, Acetone, Isopropanol, adherence promoter).
Kit composition (not exhaustive)
Our specialists selected and adapted the best instruments to make them work together with reliable process.
Programmable Spin coater : has advanced features for controllable and repeatable PDMS layers. It can be easily programmed from your PC, or directly from the operator pannel, makes low vibration, and has a speed up to 12 000 rpm. Provided with wafer centering tool.
Plasma cleaner: built for PDMS bonding. Its vacuum feedback loop enables regulation of the vacuum inside the chamber without need of hand tuning. Compatible with 3 to 6 inches wafer.
Compact UV exposure system: compatible with hard (physical) or soft (proximity) masking contacts, and features variable mask to substrate distance control. 2µm resolution.
Oven: frontal panel with bimetallic fluid expansion probe thermo regulator.
Programmable Hot plate: high termperature uniformity over 4 inches wafer.
Vacuum pump: vacuum level is enough to maintain a wafer on the spin coater chuck or to degas PDMS under 30 minutes. And c
omes with all necessary lab accessories and chemicals.
Applications
Microfluidics, Lab on chip, organ on chip,
Specifications
Detailed characteristics
UV lamp
- Weight 8,2 kg
- Power 180 W
- Power supply 110V or 230V ; 50 Hz
- Dimension (HxWxD) 260x260x260 (mm)
- Emission spectrum 365 nm ± 5 nm / 385 nm ± 5 nm
- Resolution 2 µm
- Illumination UV power 23,2 mW/cm² ± 10%
- Exposure time From 1s to 18 hours
- Time resolution 1s
- Number of memorized cycles 10
Plasma cleaner
- Weight 20,5 kg
- Power 373 W
- Power supply 110V or 230V ; 50/60 Hz
- Dimension (HxWxD) 280x460x230 (mm)
- Pressure range From 300 to 1500 mTorr
- RFpower Low (7.2 W ) Med (10.2W) Hi (29.6W)
- Chamber dimension (diamxD) Ø152x175 (mm)
Spin coater
- Weight 12.7 kg
- Power 300 W
- Power supply 95-240V ; 47/63 Hz
- Dimension (HxWxD) 303x380x380 (mm)
- Vacuum needed 20-28 inches Hg
- Operate with nitrogen or CDA 60-70 PSI (4-5 bar)
- Round per minute range (RPM) 1 to 12 000 RPM
- Wafer size Up to 6 inches
Oven
- Weight 10 kg
- Power 360 W
- Power supply 110V or 230V; 50/60 Hz
- External dimensions (HxWxD) 380x240x300 (mm)
- Internal dimensions (HxWxD) 190x150x190 (mm)
- Temperature range Ambient +1°C to 150°C
- Temperature resolution 3°C
- Volume 5.4 lite
Hot plate
- Weight 8kg
- Power 600 W
- Power supply 110V or 230V 50/60 Hz
- Dimensions (HxWxD) 150x250x350 (mm)
- Heating Surface Area 204x204 (mm)
- Top plate Material Aluminum
- Temperature range Ambient +1°C to 450°C
- Temperature resolution 1°C
Vacuum pump
- Weight 12.3 kg
- Power 373 W
- Power supply 115V or 230V ; 50/60 Hz
- Dimension (HxWxD) 248x356x140 (mm)
- Air flow 5.1 m3 /hour
